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I. Equipment Overview:

The horizontal diffusion furnace equipment can be applied in various fields such as integrated circuits, discrete devices, POWER, and MEMS. It is suitable for oxidation, diffusion, GPP, annealing, and alloying processes for 4-8 inch wafer chips.

The diffusion process involves inserting impurity elements into the silicon substrate at high temperatures using thermal diffusion principles to achieve a specific concentration distribution. This alters the electrical properties of the material, forming semiconductor device structures. It can be used to create PN junctions or components like resistors, capacitors, diodes, and transistors in integrated circuits.

II. Equipment Parameter Types:

III. Key Features and Advantages of the Equipment

1★ Powerful operational capabilities with a Windows-based interface and display screen, allowing users to conveniently modify process control parameters and monitor real-time process statuses. Equipped with fault self-diagnosis software, significantly reducing maintenance time.

2★ Reliable industrial computer + PLC mode for fully automated control of furnace temperature, boat movement, gas flow, and valves, achieving complete automation of the entire process.

3★ Programs support manual/automatic operation. After power outages or mid-process stops, restarting allows temperature ramping based on manual process settings, saving process time.

4★ Multiple process pipelines available for user convenience.

5★ Cold end uses PT100 to detect ambient temperature for compensation, avoiding environmental temperature fluctuations that affect furnace temperature and preventing interlayer interference.

6★ Boat movement control employs high-speed pulse closed-loop control to prevent motor step loss and operational vibrations. After completing a cycle, the boat automatically calibrates its position to effectively prevent positioning deviations.

7★ Precise gas flow control with analog signal closed-loop control, strong/weak electrical separation, and standard bus for data exchange to enhance anti-interference capability and ensure data security. Gas valves feature soft-start functionality.

8★ Multiple alarm functions and safety protection features.
9★ Automatic adjustment of constant temperature zone with cascade control, enabling accurate control of the actual process temperature in the reaction tube.